3

A kinetic model for radio frequency plasma-activated chemical vapour deposition

Year:
1978
Language:
english
File:
PDF, 404 KB
english, 1978
7

Dynamic analyses in mass spectrometry of SF6 plasma during etching of silicon

Year:
1989
Language:
english
File:
PDF, 442 KB
english, 1989
14

Dry Etching of Polyimide in O[sub 2]-CF[sub 4] and O[sub 2]-SF[sub 6] Plasmas

Year:
1983
Language:
english
File:
PDF, 844 KB
english, 1983